The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.


镜实验,观察到
合二氧化硅具有微米亚微米纳米三次结
。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.


镜实验,观察到
合二氧化硅具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
汽氧化是以高纯
蒸汽为氧化气氛,由硅片表面的硅原

分
反应生成二氧化硅。
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